![Fabrication of a hybrid structure of diamond nanopits infilled with a gold nanoparticle - RSC Advances (RSC Publishing) Fabrication of a hybrid structure of diamond nanopits infilled with a gold nanoparticle - RSC Advances (RSC Publishing)](https://pubs.rsc.org/image/article/2014/ra/c4ra03196b/c4ra03196b-f5_hi-res.gif)
Fabrication of a hybrid structure of diamond nanopits infilled with a gold nanoparticle - RSC Advances (RSC Publishing)
![Si02 etch rates v� in CF 4 /02 (0), NF3/Ar (U), and F2/Ar (©)plasmas,... | Download Scientific Diagram Si02 etch rates v� in CF 4 /02 (0), NF3/Ar (U), and F2/Ar (©)plasmas,... | Download Scientific Diagram](https://www.researchgate.net/profile/Daniel-Flamm/publication/224532761/figure/fig5/AS:670710468997129@1536921245239/Si02-etch-rates-v-in-CF-4-02-0-NF3-Ar-U-and-F2-Ar-Cplasmas-at-100-kHz-035.png)
Si02 etch rates v� in CF 4 /02 (0), NF3/Ar (U), and F2/Ar (©)plasmas,... | Download Scientific Diagram
![Versatile fabrication and applications of dense, orderly arrays of polymeric nanostructures over large areas - Journal of Materials Chemistry B (RSC Publishing) Versatile fabrication and applications of dense, orderly arrays of polymeric nanostructures over large areas - Journal of Materials Chemistry B (RSC Publishing)](https://pubs.rsc.org/image/article/2014/tb/c4tb00836g/c4tb00836g-f1_hi-res.gif)
Versatile fabrication and applications of dense, orderly arrays of polymeric nanostructures over large areas - Journal of Materials Chemistry B (RSC Publishing)
![Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon - Sun - 2018 - Advanced Materials Interfaces - Wiley Online Library Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon - Sun - 2018 - Advanced Materials Interfaces - Wiley Online Library](https://onlinelibrary.wiley.com/cms/asset/8665b504-0453-4fd9-8f46-6650ca0a992b/admi201800836-fig-0001-m.jpg)
Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon - Sun - 2018 - Advanced Materials Interfaces - Wiley Online Library
![Silicon Nanostructuring Using SF6/O2 Downstram Plasma Etching: Morphological, Optical and Sensing Properties Silicon Nanostructuring Using SF6/O2 Downstram Plasma Etching: Morphological, Optical and Sensing Properties](http://www.scielo.br/img/revistas/mr/v21n5//1516-1439-mr-21-05-e20171082-gf03.jpg)
Silicon Nanostructuring Using SF6/O2 Downstram Plasma Etching: Morphological, Optical and Sensing Properties
![Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon - Sun - 2018 - Advanced Materials Interfaces - Wiley Online Library Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon - Sun - 2018 - Advanced Materials Interfaces - Wiley Online Library](https://onlinelibrary.wiley.com/cms/asset/91aedb5e-ebbf-4f06-9e54-8f74db6f2539/admi201800836-fig-0002-m.jpg)
Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon - Sun - 2018 - Advanced Materials Interfaces - Wiley Online Library
![Hydrogen plasma etching mechanism at the a-C:H/a-SiCx:H interface: A key factor for a-C:H adhesion - ScienceDirect Hydrogen plasma etching mechanism at the a-C:H/a-SiCx:H interface: A key factor for a-C:H adhesion - ScienceDirect](https://ars.els-cdn.com/content/image/1-s2.0-S0169433218315290-fx1.jpg)
Hydrogen plasma etching mechanism at the a-C:H/a-SiCx:H interface: A key factor for a-C:H adhesion - ScienceDirect
Development and characterization of plasma etching processes for the dimensional control and LWR issues during High-k Metal gate
![Etching rate in a high-density plasma reactor in oxygen plasma left and... | Download Scientific Diagram Etching rate in a high-density plasma reactor in oxygen plasma left and... | Download Scientific Diagram](https://www.researchgate.net/profile/Panagiotis-Argitis/publication/249512338/figure/fig2/AS:669043530936323@1536523816278/Etching-rate-in-a-high-density-plasma-reactor-in-oxygen-plasma-left-and-SF-6-plasma-right_Q320.jpg)
Etching rate in a high-density plasma reactor in oxygen plasma left and... | Download Scientific Diagram
![Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage: Journal of Vacuum Science & Technology B: Vol 29, No 1 Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage: Journal of Vacuum Science & Technology B: Vol 29, No 1](https://avs.scitation.org/action/showOpenGraphArticleImage?doi=10.1116/1.3521489&id=images/medium/1.3521489.figures.f5.gif)
Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage: Journal of Vacuum Science & Technology B: Vol 29, No 1
![Morphological and Chemical Effects of Plasma Treatment with Oxygen (O2) and Sulfur Hexafluoride (SF6) on Cellulose Surface Morphological and Chemical Effects of Plasma Treatment with Oxygen (O2) and Sulfur Hexafluoride (SF6) on Cellulose Surface](http://www.scielo.br/img/revistas/mr/v20s2//1516-1439-mr-1980-5373-MR-2016-1111-gf01.jpg)
Morphological and Chemical Effects of Plasma Treatment with Oxygen (O2) and Sulfur Hexafluoride (SF6) on Cellulose Surface
![Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide: Journal of Vacuum Science & Technology A: Vol 31, No 2 Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide: Journal of Vacuum Science & Technology A: Vol 31, No 2](https://avs.scitation.org/action/showOpenGraphArticleImage?doi=10.1116/1.4780122&id=images/medium/1.4780122.figures.f8.gif)